Recent Finacing
Recent Raise
SCIL commercialises Substrate Conformal Imprint Lithography to pattern sub‑10 nm features with ~1 µm overlay on wafers up to 300 mm for high‑volume applications like AR optics, lasers, biosensors.
Focus Areas
Recent Investors
Total Raised
Funding round
Investors
See the team members at SCIL Nanoimprint solutions.
